Guide Chemical Vapour Deposition: Precursors, Processes and Applications Edition

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  1. Chemical Vapour Deposition: Precursors, Processes and Applications / Edition 1
  2. 1st Edition
  3. [PDF] Chemical Vapour Deposition: Precursors, Processes and Applications - Semantic Scholar

This is a preview of subscription content, log in to check access. French M Conceptual design for engineers, 2nd edn. Design Council, London Google Scholar. Pahl G, Beitz W Engineering design - a systematic approach, 2nd edn. Springer, London Google Scholar. Yan XT A multiple perspective product modelling and simulation approach to enhancing engineering design decision making.

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J Cryst Growth — Google Scholar. Wiley, New York, p Google Scholar. Campbell S A The science and engineering of microelectronic fabrication, 2nd edn. Wenger, C. Baristiran-Kaynak, K. Lakribssi, T. Toader, C. Bock, D. Becker, H. Osten, U. Kunze, A. Vapor Deposition, 18, , 30 K. Xu, R. Ranjith, A. Laha, H. Milanov, R. Fischer, E. Bugiel, J. Feydt, S. Irsen, T. Cybinsa, D. Gasparotto, B. Niermann, H. Becker, d. Rogalla, J. Irsen, A. Mudring, J. Winter, R. Devi, Atomic vapour deposition approach to In2O3 thin films, J.

Laha, E. Bugiel, R.

Ranjith, D. Schwendt, H. Osten, H. Devi, M. Hellwig, D. Barreca, H.

Chemical Vapour Deposition: Precursors, Processes and Applications / Edition 1

Thomas, H. Becker, R. Katiyar, R. Vapor Deposition, 16, , 26 M. Cokoja, H. Birkner, R. Fischer, O. Margeat, D. Ciuculescu, C. Amiens, B. Chaudret, A. Falqui, P. Thiede, H. Reuter, G. Passing, S. Kirchmeyer, J. Lemberger, A. Bauer, D. Gasparotto, R. Fischer, Deposition of niobium nitride thin films from tert-butyl amido-tris diethylamido niobium by modified industrial reactor, Chem. Vapor Deposition, 15, , 24 A. Milanov, T. Toader, H. Gasparotto, C. Bock, H. Ngwashi, R. Paul, U. Kunze, R. Pothiraja, A. Milanov, A, H. Baunemann, D. Bekermann, T.

Winter, C. Gemel, R.

1st Edition

Cokoja, B. Jagirdar, H. Chem, 21, , 20 T. Bauer, R. Baunemann, M. Bauer, H. Deposition, , , 18 M. Lemberger, S. Thiemann, A.

Baunemann, H. Fischer, J. Hinz, A. Rische, H. Baunernann, T. Thiede, R. Technol, , , 16 M. Birkner, O. Shekhah, M. Schroter, A. Birkner, M. Grunert, R.


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Klementiev, W. Parala, E. Gemel, M. Fischer, New tungsten VI guanidinato complexes: Synthesis, characterization, and application in metal-organic chemical vapor deposition of tungsten nitride thin films, Chem. Schroder, S.

[PDF] Chemical Vapour Deposition: Precursors, Processes and Applications - Semantic Scholar

Hermes, H. Hikov, M. Muhler, R. Fischer, Non aqueous loading of the mesoporous siliceous MCM matrix with ZnO: a comparison of solution, liquid and gas-phase infiltration using diethyl zinc as organometallic precursor: J. Kim, A. Devi, R. Deposition, 11, , 10 R. Parala, F. Hipler, O. Tkachenko, K. Wilmer, O. Hinrichsen, M. Muhler, A.

Skal 31 - Chemical Vapor Deposition (CVD): APCVD, LPCVD

Birkner, C. Khanderi, A. Wohlfart, H.